| Name |
Institution |
Start time |
Title |
| Opening remarks |
| Bill Ott |
NIST |
9:00 |
Welcome |
| Bill Gadzuk |
NIST |
9:05 |
Introduction and historical context |
| Shannon Hill |
NIST |
9:15 |
Motivation, goals and outline for workshop |
| Fundamentals (Gadzuk) |
| John Yates |
University of Virginia |
9:20 |
Surface chemistry in EUV |
| Karl Johnson |
University of Pittsburgh |
10:00 |
Molecular modeling of adsorption processes |
| Robert Bartynski |
Rutgers University |
10:30 |
TBA |
| Chundao Wang |
Tulane University |
10:50 |
Carbon removal from EUV mirror cap layers: model studies |
| Break and discussion |
|
11:05 |
|
| Related carbon-deposition studies (Hill) |
| Howard Fairbrother |
Johns Hopkins University |
11:35 |
Abatement of carbon contamination on solid surfaces using atomic radicals |
| Andras Vladar |
NIST |
12:00 |
Electron Beam-Induced contamination in the SEM: a Thing of the Past |
| Gil Delgado |
KLA Tencor |
12:20 |
Photo-induced contamination of optical elements of reticle and wafer inspection systems |
| Discussion and lunch (delivered, ~$10 each) |
12:50 |
|
| Carbon contamination in EUVL (Lucatorto) |
| Andrea Wuest |
SEMATECH |
13:50 |
Overview of EUVL and the optics contamination problem |
| Noreen Harned |
ASML |
14:05 |
Strategy for minimizing EUVL optics contamination during exposure |
| Uzo Okoroanyanwu |
Global Foundries |
14:25 |
Analysis of Contaminated EUV Masks |
| S.Hill for I. Nishiyama |
NIST/Selete |
14:45 |
Summary of Selete optics contamination (Tentative) |
| Break and discussion |
|
14:55 |
|
| Measurement & modeling EUV carbon contamination (Wuest) |
| Shannon Hill |
NIST |
15:25 |
Measurement for non-linear scaling laws for EUV optics contamination |
| Greg Denbeaux |
CNSE, Albany |
15:45 |
The influence of out of band radiation on EUV optics contamination |
| Vibhu Jindal |
Sematech |
16:00 |
Modelling of EUV optics contamination: Issues and Approaches |
| Discussion |
|
16:20 |
|
| Summary (Hill) |
|
|
| Discussion |
|
16:40 |
|
| Adjourn |
17:00 |
|
