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Workshop on Surface Science Related to EUV Optics Contamination
06/02/2009, NIST

Presentations

Boris Yakshinskiy, Shimon Zalkind, Nejib Hedhili, Theodore Madey and Robert Bartynski
Rutgers, The State University of New Jersey

The Adsorption of hydrocarbons on model multilayer mirror surfaces: TiO2(011), Ru(1010) and Al2O3 films
Greg Denbeaux, Petros Thomas, Yu-Jen Fan, Alin Antohe, Leonid Yankulin, Rashi Garg
CNSE, University at Albany
Andrea Wüest, Vibhu Jindal
SEMATECH
The influence of out of band radiation on EUV optics contamination
Shannon Hill, Nadir Faradzhev, Charles Tarrio and Thomas Lucatorto
National Institute of Standards & Technology (NIST)
R. A. Bartynski, B. V. Yakshinskiy, T. E. Madey
Rutgers, the State University of New Jersey
Measuring the EUV-induced contamination rates of TiO2-capped multilayer optics by anticipated production-environment organics
Howard Fairbrother
Johns Hopkins University
Carbon abatement of EBID Deposits
Vibhu Jindal, Andrea Wüest
SEMATECH
Modeling of EUV optics carbon contamination: Issues and Approaches
J. Karl Johnson
University of Pittsburgh
Fundamentals of Molecular Modeling of Adsorption
Uzo Okoroanyanwu, Kornelia Dittmar, Torsten Fahr, Tom Wallow, Bruno La Fontaine, Obert Wood
Global Foundries
Analysis of Contaminated EUV Masks
András E. Vladár, Kavuri P. Purushotham and Michael T. Postek
National Institute of Standards & Technology (NIST)
Electron Beam-Induced Contamination in the Scanning Electron Microscope: a Thing of the Past
Chuandao Wang, Shao-chun Li, Michael Johnson, Ulrike Diebold
Tulane University
Carbon removal from EUV mirror cap layers: model studies
Andrea Wüest
SEMATECH
Overview of EUV Lithography and EUV Optics Contamination
John T. Yates, Jr.
University of Virginia
Photochemistry on Surfaces - Applications to EUV Mirror Cleanup

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Last update: October 7, 2009