Presentations
Boris Yakshinskiy, Shimon Zalkind, Nejib Hedhili, Theodore Madey and Robert Bartynski
Rutgers, The State University of New Jersey
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The Adsorption of hydrocarbons on model multilayer mirror surfaces: TiO2(011), Ru(1010) and Al2O3 films |
Greg Denbeaux, Petros Thomas, Yu-Jen Fan, Alin Antohe, Leonid Yankulin, Rashi Garg CNSE, University at Albany Andrea Wüest, Vibhu Jindal SEMATECH |
The influence of out of band radiation on EUV optics contamination |
Shannon Hill, Nadir Faradzhev, Charles Tarrio and Thomas Lucatorto
National Institute of Standards & Technology (NIST)
R. A. Bartynski, B. V. Yakshinskiy, T. E. Madey
Rutgers, the State University of New Jersey |
Measuring the EUV-induced contamination rates of
TiO2-capped multilayer optics by anticipated
production-environment organics |
Howard Fairbrother
Johns Hopkins University |
Carbon abatement of EBID Deposits |
Vibhu Jindal, Andrea Wüest SEMATECH |
Modeling of EUV optics carbon
contamination: Issues and Approaches |
J. Karl Johnson
University of Pittsburgh |
Fundamentals of Molecular Modeling of Adsorption |
Uzo Okoroanyanwu, Kornelia Dittmar, Torsten Fahr,
Tom Wallow, Bruno La Fontaine, Obert Wood Global Foundries |
Analysis of Contaminated EUV Masks |
András E. Vladár, Kavuri P. Purushotham
and Michael T. Postek
National Institute of Standards & Technology (NIST) |
Electron Beam-Induced Contamination
in the Scanning Electron Microscope:
a Thing of the Past |
Chuandao Wang, Shao-chun Li, Michael Johnson,
Ulrike Diebold Tulane University |
Carbon removal from EUV mirror cap layers:
model studies |
Andrea Wüest SEMATECH |
Overview of EUV Lithography and EUV Optics Contamination |
John T. Yates, Jr. University of Virginia |
Photochemistry on Surfaces - Applications to EUV Mirror Cleanup |
Presentations are in Portable Document Format (PDF). Please get Adobe Reader here if necessary.
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However, the views expressed and the decisions reported do not necessarily
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