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1998 NIST Photometry Short Course
September 10-11, 1998
The Optical Technology Division hosted the first NIST Photometry Short Course on 10th and 11th of September 1998 at NIST, Gaithersburg with 19 participants from industry and academia. The number of participants had to be limited due to the experimental sessions provided in the Course. A tour of the Division laboratories for the participants was also given on the 9th. The course addressed the need for education and training for photometry engineers and technicians in industry that had been stressed recently by CORM, Lamp Testing Engineer's Conference (LTEC), and other metrology groups within industry. The course was mainly aimed at customers of NIST photometric calibrations, and more widely, technicians and engineers engaged in photometry work in industry. The course covered fundamentals in photometry, radiometry, colorimetry, uncertainty analysis, quality systems, and practical aspects of measurements of luminous flux, luminous intensity, illuminance, luminance, color temperature, and chromaticity of light sources. The course consisted of lectures by NIST scientists (Dr. Y. Ohno, Dr. S. Brown, and Ms. S. Bruce) and Dr. G. Sauter, a distinguished guest scientist from Physikalisch-Technische Bundesanstalt (PTB), Germany. The course also featured hands-on experiments at the NIST photometry laboratory using the 4 m bench, the new 2.5 m integrating sphere, and other additional setups. Course participants, divided into three groups, performed actual measurements of luminous intensity, illuminance, total luminous flux, and color temperature. Based on its demand and the feedback we received from the participants, the short course will be offered again next year with an extended schedule.
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