Publications by Thomas A. Germer

Patrick, H.J., Germer, T.A., Ding, Y., Ro, H.W., Richter, L.J., and Soles, C.L.:

"In situ measurement of annealing-induced line shape evolution in nanoimprinted polymers using scatterometry," (Preprint 446 kb)  
in Alternative Lithographic Technologies, F.M. Schellenberg, Ed., Proc. SPIE 7271, in press (2009).

Germer, T.A., Patrick, H.J., Silver, R.M., and Bunday, B.:

"Developing an Uncertainty Analysis for Optical Scatterometry," (Preprint 200 kb)  
in Metrology, Inspection, and Process Control for Microlithography XXIII, J.A. Allgair, Ed., Proc. SPIE 7272, in press (2009).

Bergner, B.C., Germer, T.A., and Suleski, T.J.:

"Effect of Line Width Roughness on Optical Scatterometry Measurements," (Preprint 223 kb)  
in Metrology, Inspection, and Process Control for Microlithography XXIII, J.A. Allgair, Ed., Proc. SPIE 7272, in press (2009).

Sparks, W.B., Hough, J., Germer, T.A., Chen, F., DasSarma, S., DasSarma, P., Robb, F.T., Manset, N., Kolokolova, L., Reid, N., Macchetto, F.D., and Martin, W.:

"Detection of Circular Polarization in Light Scattered from Photosynthetic Microbes,"
Journal of Quantitative Spectroscopy and Radiative Transfer, in press (2009).

Patrick, H.J., Germer, T.A., Ding, Y., Ro, H.W., Richter, L.J., and Soles, C.L.:

"Scatterometry for in situ measurement of pattern reflow in nanoimprinted polymer gratings," (Preprint 236 kb) 
Applied Physics Letters 93, 233105 (2008).

Sparks, W., Hough, J., Germer, T.A., Chen, F., DasSarma, S., DasSarma, P., Robb, F., Reid, N., Manset, N., Kolokolova, L., Macchetto, F.D., Martin, W.:

"Towards a Remote Sensing Capability for Life's Chiral Signature using Circular Polarization,"
Proceedings of the National Academy of Sciences, in press (2009).

Patrick, H.J., Germer, T.A., Cresswell, M.W., Li, B., Huang, H., and Ho, P.S.:

"Extraction of trench geometry and linewidth of nanoscale grating targets in (110)-oriented silicon using angle-resolved scatterometry,"
in Instrumentation, Metrology, and Standards for Nanomanufacturing II, Postek, M.T., Ed., Proc. SPIE 7042, 70420B (2008).

Attota, R., Germer, T.A., and Silver, R.M.:

"Through-focus scanning-optical-microscope imaging method for nanoscale dimensional analysis," (Reprint 306 kb) 
Optics Letters 33 (17), 1990-1992 (2008).

Kenyon, E., Cresswell, M.W., Patrick, H.J., and Germer, T.A.:

"Modeling the effect of finite size gratings on scatterometry measurements," (Preprint 233 kb) 
in Metrology, Inspection, and Process Control for Microlithography XXII, Proc. SPIE 6922, 69223P (2008).

Germer, T.A., Wolters, C., and Brayton, D.:

"Calibration of wafer surface inspection systems using spherical silica particles," (Reprint 252 kb) 
Optics Express 16 (7), 4698-4705 (2008).

Patrick, H.J., Attota, R., Barnes, B.M., Germer, T.A., Stocker, M.T., Silver, R.M., and Bishop, M.R.:

"Optical Critical Dimension Measurement of Sub-resolution Silicon Grating Targets using Back Focal Plane Imaging Scatterfield Microscopy," (Reprint 527 kb) 
Journal of Micro/Nanolithography, MEMS, and MOEMS 7, 013012 (2008).

Boulbry, B., Ramella-Roman, J.C., and Germer, T.A.:

"Truncated singular value decomposition method for calibrating a Stokes polarimeter,"
in Polarization Science and Remote Sensing III, Shaw, J.A., and Tyo, J.S., Eds., Proc. SPIE 6682, 66820M (2007).

Patrick, H.J., and Germer, T.A.:

"Progress towards traceable nanoscale optical critical dimension metrology for semiconductors," (Preprint 834 kb) 
in Advanced Characterization Techniques for Optics, Semiconductors, and Nanotechnologies III, Duparre, A., Singh, B., and Gu, Z.-H., Eds., Proc. SPIE 6672, 66720L (2007).

Patrick, H.J., Germer, T.A., Cresswell, M.W., Allen, R.A., Dixson, R.G., and Bishop, M.:

"Modeling and Analysis of Scatterometry Signatures for Optical Critical Dimension Reference Material Applications," (Preprint 206 kb) 
in Frontiers of Characterization and Metrology for Nanoelectronics: 2007, Proc. AIP 931, 392-396 (2007).

Germer, T.A.:

"Modeling the effect of line profile variation on optical critical dimension metrology," (Preprint 348 kb) 
in Metrology, Inspection, and Process Control for Microlithography XXI, Proc. SPIE 6518, 65180Z (2007).

Silver, R., Germer, T., Attota, R., Barnes, B.M., Bunday, B., Allgair, J., Marx, E., and Jun, J.:

"Fundamental Limits of Optical Critical Dimension Metrology: A Simulation Study,"
in Metrology, Inspection, and Process Control for Microlithography XXI, Proc. SPIE 6518, 65180U (2007).

Allen, R.A., Patrick, H.J., Bishop, M., Germer, T.A., and Cresswell, M.W.:

"Study of Test Structures for Use as Reference Material in Optical Critical Dimension Applications,"
in 2007 IEEE International Conference on Microelectronic Test Structures, held March 19-22, 2007 in Tokyo, Japan., pp. 20-25 (2007).

Ramella-Roman, J.C., Boulbry, B., and Germer, T.A.:

"Hemispherical imaging of skin with polarized light,"
in Saratov Fall Meeting 2006: Optical Technologies in Biophysics and Medicine VIII, Tuchin, V.V., Ed., Proc. SPIE 6535, 65350U (2007).

Boulbry, B., Ramella-Roman, J.C., and Germer, T.A.:

"Improved method for calibrating a Stokes polarimeter," (Reprint 829 kb) 
Applied Optics 46 (35), 8533-8541(2007).

Ding, Y., Ro, H.W., Germer, T.A., Douglas, J.F., Okerberg, B., Karim, A., Soles, C.L.:

"Relaxation behavior of polymer structures fabricated by nanoimprint lithography," (Reprint 984 kb) 
ACS Nano 1(2), 84-92 (2007).

Dyer, S.D., Dennis, T., Street, L.K., Etzel, S.M., Germer, T.A., and Dienstfrey, A.:

"Spectroscopic phase-dispersion optical coherence tomography measurements of scattering phantoms," (Reprint 501 kb) 
Optics Express, 14 (18), 8138-8153 (2006).

Germer, T.A.:

"Effect of line and trench profile variation on specular and diffuse reflectance from a periodic structure," (Reprint 138 kB) 
J. Opt. Soc. Am. A, 24 (3), 696-701 (2007).

Patrick, H.J., Attota, R., Germer, T.A., Stocker, M., Silver, R.M.:

"Scatterfield microscopy using conventional and back focal plane imaging with an engineered illumination field," (Preprint 328 kB) 
in Metrology, Inspection, and Process Control for Microlithography XX, C.N. Archie, Ed. Proc. SPIE 6152, 61520J (2006).

Germer, T.A., and Marx, E.:

"Simulations of Optical Microscope Images," (Preprint 477 kB) 
in Metrology, Inspection, and Process Control for Microlithography XX, C.N. Archie, Ed. Proc. SPIE 6152, 61520I (2006).

Boulbry, B., Germer, T.A., and Ramella-Roman, J.C.:

"A novel hemispherical spectro-polarimetric scattering instrument for skin lesion imaging," (Preprint 1104 kB) 
in Photonic Therapeutics and Diagnostics II, N. Kollias, et al., Eds., Proc. SPIE 6078, 128-134 (2006).

Dyer, S.D., Dennis, T., Williams, P.A., Street, L.K., Etzel, S.M., Espejo, S.J., Germer, T.A., and Milner, T.E.:

"High Sensitivity Measurements of the Scattering Dispersion of Phantoms using Spectral Domain Optical Coherence Tomography,"
in Coherence Domain Optical Methods and Optical Coherence Tomography in Biomedicine X, V.V. Tuchin, J.A. Izatt, J.G. Fujimoto; Eds., Proc. SPIE 6079, 307-311 (2006).

Germer, T.A.:

"Measuring Interfacial Roughness by Polarized Optical Scattering," (Preprint 129 kB) 
in Light Scattering and Nanoscale Surface Light Scattering, Chapter 10, Alexei A. Maradudin, Ed., in press (2006).

Attota, R., Silver, R.M., Germer, T.A., Bishop, M., Larrabee, R., Stocker, M.T., and Howard, L.:

"Application of through-focus focus-metric analysis in high resolution optical metrology,"
in Metrology, Inspection, and Process Control for Microlithography XIX, Silver, R.M., ed., Proc. SPIE 5752, 1441-1449 (2005).

Silver, R.M., Attota, R., Stocker, M., Bishop, M., Howard, L., Germer, T., Marx, E., Davidson, M., and Larrabee, R.:

"High-resolution optical metrology,"
in Metrology, Inspection, and Process Control for Microlithography XIX, Silver, R.M., ed., Proc. SPIE 5752, 67-79 (2005).

Germer, T.A., and Mulholland, G.W.:

"Particle Size Metrology: Comparison Between Aerosol Electrical Mobility and Laser Surface Light Scattering Techniques" (Preprint 115 kB) 
in Characterization and Metrology for ULSI Technology 2005, Seiler, D.G., et al. eds., Proc. AIP 788, 579-583 (2005).

Ramella-Roman, J.C., Duncan, D., and Germer, T.A.,

"Out-of-plane polarimetric imaging of skin: Surface and subsurface effects," (Preprint 639 kB) 
in Photonic Therapeutics and Diagnostics, Bartels, K.E., et al., eds., Proc. SPIE 5686, 142-153 (2005).

Kim, J.H., Ehrman, S.H., and Germer, T.A.,

"Influence of particle oxide coating on light scattering by submicron metal particles on silicon wafers," (Preprint 94 kB) 
Appl. Phys. Lett. 84(8), 1278-1280 (2004).

Germer, T.A. and Marx, E.:

"Ray model of light scattering by flake pigments or rough surfaces beneath smooth transparent coatings," (Preprint 131 kB) 
Applied Optics 43(6), 1266-1274 (2004).

Germer, T.A.:

"Scattering by slightly non-spherical particles on surfaces," (Preprint 62 kB) 
in Seventh Conference on Electromagnetic and Light Scattering by Nonspherical Particles: Theory, Measurements, and Applications, T. Wriedt, ed., (Universitaet Bremen, Bremen, Germany, 2003), pp. 93-96.

Germer, T.A.:

"Polarized light diffusely scattered under smooth and rough surfaces," (Preprint 233 kB) 
in Polarization Science and Remote Sensing, J. A. Shaw and J. S. Tyo, Eds., Proc. SPIE 5158, 193-204 (2003).

Germer, T.A. and Fasolka, M.J.:

"Characterizing surface roughness of thin films by polarized light scattering," (Preprint 335 kB) 
in Advanced Characterization Techniques for Optics, Semiconductors, and Nanotechnologies, A. Duparr,Ai(B and B. Singh, Eds., Proc. SPIE 5188, 264-275 (2003).

Kim, J.H., Ehrman, S.H., Mulholland, G.W., Germer, T.A.:

"Polarized light scattering by dielectric and metallic spheres on oxidized silicon wafers," (Preprint 221 kB) 
Applied Optics, 43(3), 585-591 (2004).

Mulholland, G.W., Germer, T.A., and Stover, J.C.:

"Modeling, Measurement, and Standards for Wafer Inspection," (Preprint 67 kB) 
in Government Microcircuit Applications and Critical Technology Conference 2003, in press (2003).

Kim, J.H., Germer, T.A., Babushok, V.I., Mulholland, G.W., and Ehrman, S.H.:

"Co-Solvent Assisted Spray Pyrolysis for the Generation of Metal Particles," (Preprint 498 kB) 
Journal of Materials Research, 18 (7), 1614-1622 (2003).

Kim, J.H., Ehrman, S.H., Mulholland, G.W., Germer, T.A.:

"Polarized light scattering by dielectric and metallic spheres on silicon wafers," (Preprint 205 kB) 
Applied Optics 41 (25), 5405-5412 (2002).

Germer, T.A.:

"Measurement of lithographic overlay by light scattering ellipsometry," (Preprint 214 kB) 
in Surface Scattering and Diffraction for Advanced Metrology II, Z.-H. Gu, and A.A. Maradudin, Eds., Proc. SPIE 4780, 72-79 (2002).

Germer, T.A., Mulholland, G.W., Kim, J.H., and Ehrman, S.H.:

"Measurement of the 100 nm NIST SRM ,A. (B 1963 by laser surface light scattering," (Preprint 253 kB) 
in Advanced Characterization Techniques for Optical, Semiconductor, and Data Storage Components, A. Duparr ,Ai (B and B. Singh, Eds., Proc. SPIE 4779, 60-71 (2002).

Germer, T.A.:

"Light scattering by slightly non-spherical particles on surfaces," (Preprint 43 kB) 
Optics Letters 27 (13), 1159-1161 (2002).

Kim, J.H., Germer, T.A., Mulholland, G.W., and Ehrman, S.H.:

"Size-monodisperse metal nanoparticles via hydrogen-free spray pyrolysis," (Preprint 824 kB) 
Adv. Mater. 14(7), 518-521 (2002).

Kim, J.H., Ehrman, S.H., Mulholland, G.W., and Germer, T.A.:

"Polarized light scattering from metallic particles on silicon wafers," (Preprint 253 kB) 
in Optical Metrology Roadmap for the Semiconductor, Optical, and Data Storage Industries, A. Duparr,Ai(B and B. Singh, Eds., Proc. SPIE 4449, 281-290 (2001).

Germer, T.A. and Nadal, M.E.:

"Modeling the appearance of special effect pigment coatings," (Preprint 129 kB) 
in Surface Scattering and Diffraction for Advanced Metrology, Z.-H. Gu, and A.A. Maradudin, Eds., Proc. SPIE 4447, 77-86 (2001).

Nadal, M.E. and Germer, T.A.:

"Colorimetric characterization of pearlescent coatings,"
in Proceedings of the Ninth Congress of the International Color Association, Proc. SPIE 4421, 757-760 (2002).

Germer, T.A.:

"Large angle in-plane light scattering from rough surfaces: comment" (Preprint 49 kB) 
Appl. Opt. 40(31), 5708-5710 (2001).

Germer, T.A.:

"Polarized light scattering by microroughness and small defects in dielectric layers," (Preprint 224 kB) 
J. Opt. Soc. Am. A, 18(6), 1279-1288 (2001).

Germer, T.A., Gupta, R., Hanssen, L.M., and Shirley, E.L.:

"Optical Properties of Materials"
Optics and Photonics News 12(2) 38-42, (2001).

Germer, T.A.:

"Characterizing Interfacial Roughness by Light Scattering Ellipsometry" (Preprint 70 kB) 
in Characterization and Metrology for ULSI Technology 2000, D. G. Seiler, A. C. Diebold, W. M. Bullis, T. J. Shaffner, R. McDonald, and E. J. Walters, eds. (AIP, New York, 2000), pp. 186-190.

Germer, T.A., Rinder, T., and Rothe, H.:

"Polarized light scattering measurements of polished and etched steel surfaces," (Preprint 119 kB) 
in Scattering and Surface Roughness III, Z.-H. Gu, and A. A. Maradudin, Eds., Proc. SPIE 4100, 148-155 (2000).

Germer, T.A.:

"Measurement of Roughness of Two Interfaces of a Dielectric Film by Scattering Ellipsometry," (Preprint 55 kB) 
Phys. Rev. Lett. 85(2), 349-352 (2000).

Marx, E., Germer, T.A., Vorgurger, T., and Park, B.C.:

"Angular Distribution of Light Scattered From a Sinusoidal Grating," (Preprint 204 kB) 
Appl. Opt., 39(25), 4473-4485 (2000).

Shaw, P.-S., Gupta, R., Germer, T.A., Arp, U., Lucatorto, T., and Lykke, K.R.:

"Material Characterization using ACR-based beamline at SURF III,"
Metrologia, 37(5), 551-554 (2000).

Priest, R.G. and Germer, T.A.:

"Polarimetric BRDF in the Microfacet Model: Theory and Measurements," (Preprint 99 kB) 
in Proceedings of the 2000 Meeting of the Military Sensing Symposia Specialty Group on Passive Sensors, Vol. 1, pp. 169-181 (Infrared Information Analysis Center, Ann Arbor, MI, August 2000).

Germer, T.A. and Sung, L.:

"Polarized light scattering measurements of roughness, subsurface defects, particles, and dielectric layers on silicon wafers," (Preprint 78 kB) 
in 4^th Conference on Electromagnetic and Light Scattering by Nonspherical Particles. Theory and Applications, Vigo, Spain, pp. 223-230 (1999).

Germer, T.A.:

"Multidetector Hemispherical Polarized Light Scattering Instrument," (Preprint 1.2 MB) 
in Rough Surface Scattering and Contamination, P.-T. Chen, Z.-H. Gu, and A. A. Maradudin, Editors, Proc. SPIE 3784, 296-303 (1999).

Sung, L., Mulholland, G. W. and Germer, T. A.:

"Polarization of light scattered by spheres on a dielectric film," (Preprint 545 kB) 
in Rough Surface Scattering and Contamination, P.-T. Chen, Z.-H. Gu, and A. A. Maradudin, Editors, Proc. SPIE 3784, 304-313 (1999).

Sung, L., Mulholland, G. W. and Germer, T. A.:

"Polarized light-scattering measurements of dielectric spheres upon a silicon surface," (Preprint 409 kB) 
Opt. Lett. 24, 866-868 (1999).

Sung, L., Mulholland, G. W. and Germer, T. A.:

"Polarization of light scattered by particles on silicon wafers," (Preprint 660 kB) 
in Surface Characterization for Computer Disks, Wafers, and Flat Panel Displays, J.C. Stover, Editor, Proc. SPIE 3619, 80-91 (1999).

Germer, T. A. and Asmail, C. C.:

"Goniometric optical scatter instrument for out-of-plane ellipsometry measurements," (Preprint 964 kB) 
Rev. Sci. Instrum.70, 3688-3695 (1999).

Germer, T. A. and Asmail, C. C.:

"Polarization of light scattered by microrough surfaces and subsurface defects," (Preprint 1010 kB) 
J. Opt. Soc. Am. A, 16, 1326-1332 (1999).

Kelley, E. F., Jones, G. R., and Germer, T. A.:

"The Three Components of Reflection,"
Information Display 14 (10), 24-29 (1998).

Germer, T. A. and Scheer, B. W.:

"Polarized of out-of-plane optical scatter from SiO₂ films grown on photolithographically-generated microrough silicon," (Preprint 545 kB) 
in Scattering and Surface Roughness II, Z.-H. Gu and A. A. Maradudin, Editors, Proc. SPIE 3426, 160-168 (1998).

Germer, T. A.:

"Polarized Light Scattering and its Application to Microroughness, Particle, and Defect Detection," (Reprint 67 kB) 
in Characterization and Metrology for ULSI Technology, D.G. Seiler, A.C. Diebold, W.M. Bullis, T.J. Shaffner, R. McDonald, and, E.J. Walters, eds., pp. 815-818 (AIP, New York, 1998).

Kelley, E. F., Jones, G. R., and Germer, T. A.:

"Display Reflectance Model Based on the BRDF,"
Displays 19(1), 27-34 (1998).

Germer, T. A.:

"Application of bidirectional ellipsometry to the characterization of roughness and defects in dielectric layers," (Preprint 692 kB) 
in Flatness, Roughness, and Discrete Defect Characterization for Computer Disks, Wafers, and Flat Panel Displays II, John C. Stover, Editor, Proc. SPIE 3275, 121-131(1998).

Park, B. C., Vorburger, T. V., Germer, T. A., and Marx, E.:

"Scattering from sinusoidal gratings,"
in Scattering and Surface Roughness, Z.-H. Gu and A.A. Maradudin, Editors, Proc. SPIE 3141, 65-77 (1997).

Germer, T. A., and Asmail, C. C.:

"A goniometric optical scatter instrument for bidirectional reflectance distribution function measurements with out-of-plane and polarimetry capabilities," (Preprint 546 kB) 
in Scattering and Surface Roughness, Z.-H. Gu and A.A. Maradudin, Editors, Proc. SPIE 3141, 220-231 (1997).

Germer T. A., and Asmail, C. C.:

"Bidirectional ellipsometry and its application to the characterization of surfaces," (Preprint 552 kB) 
in Polarization: Measurement, Analysis, and Remote Sensing, D.H. Goldstein and R.A. Chipman, Editors, Proc. SPIE 3121, 173-182 (1997).

Germer, T. A.:

"The angular dependence and polarization of out-of-plane optical scattering from particulate contamination, subsurface defects, and surface microroughness," (Preprint 1.1 MB) 
Appl. Opt. 36, 8798-8805 (1997).

Germer, T. A., Asmail, C. C., and Scheer, B. T.:

"The polarization of out-of-plane scattering from microrough silicon," (Preprint 316 kB) 
Opt. Lett. 22, 1284-1286 (1997).

Germer, T. A., Kolasinski, K. W., Stephenson, J. C., and Richter, L. J.,:

"Depletion-electric-field-induced second harmonic generation near oxidized GaAs(001) surfaces,"
Phys. Rev. B 55, 10694 (1997).

Germer, T. A., and Asmail, C. C.,:

"Proposed methodology for characterization of microroughness-induced optical scatter instrumentation," (Reprint 349 kB) 
in Flatness, Roughness, and Discrete Defect Characterization for Computer Disks, Wafers, and Flat Panel Displays, John C. Stover, Editor, Proc. SPIE 2862, 12-17 (1996).

Jones, G. R., Kelley, E. F., and Germer, T. A.,:

"Specular and Diffuse Reflection Measurements of Electronic Displays,"
Society of Information Displays pp. 203-206(1996).

Cavanagh, R. R., Germer, T. A., and Stephenson, J. C.,:

"Ultrafast time-resolved infrared probing of energy transfer at surfaces,"
Vib. Spectrosc., 9, 77 (1995).

Germer, T. A., Stephenson, J. C., Heilweil, E. J., and Cavanagh, R. R.,:

"Picosecond time-resolved adsorbate response to substrate heating: CO/Cu(100),"
J. Chem. Phys., 101, 1704 (1994).

Cavanagh, R. R., Germer, T. A., Heilweil, E. J., and Stephenson, J. C.,:

"Time-Resolved Measurement of Surface to Adsorbate Energy Transfer,"
Faraday Discuss. 96, 235 (1993).

Germer, T. A., Stephenson, J. C., Heilweil, E. J., and Cavanagh, R. R.,:

"Hot Carrier Excitation of Adlayers: Time-resolved Measurement of Adsorbate-Lattice Coupling,"
Phys. Rev. Lett., 71, 3327 (1993).

Germer, T. A., Stephenson, J. C., Heilweil, E. J., and Cavanagh, R. R.,:

"Picosecond measurement of substrate-to-adsorbate energy transfer: The frustrated translation of CO/Pt(111),"
J. Chem. Phys., 98, 9986 (1993).

Germer, T. A., Stephenson, J. C., and Heilweil, E. J.,:

"Time-Resolved Probes of Adsorbate-Substrate Energy Transfer,"
in High Resolution Spectroscopy Technical Digest 1993 (Optical Society of America, Washington, DC, 1993) pp. 76-79.

Germer, T. A., Cavanagh, R. R., Heilweil, E. J., and Stephenson, J. C.,:

"Ultrafast transient infrared absorption measurements of surface to adsorbate energy transfer: electronic vs. phonon effects,"
Quantum Electronics and Laser Science Conference, (Optical Society of America, Washington, DC, 1993) pp. 128-129.

Germer, T. A., Young, R. Y., Ho, W., and Ravel, M. K.,:

"A charge-coupled-device based time-of-flight charged particle analyzer,"
Rev. Sci. Instrum., 64, 3132 (1993).

Germer, T. A., and Ho, W.,:

"Formation of hydroxyl and water from photoreaction of hydrogen and molecular oxygen coadsorbed on Pt(111),"
J. Chem. Phys., 93, 1474 (1990).

Germer, T. A., and Ho, W.,:

"Direct characterization of the hydroxyl intermediate during the reduction of oxygen on Pt(111) by time-resolved electron energy loss spectroscopy,"
Chem. Phys. Lett., 94, 449 (1989).

Germer, T. A., and Ho, W.,:

"Energy transfer and photochemistry on a metal surface: Mo(CO)₆ on Rh(100),"
J. Vac. Sci. Technol. A, 7, 1878 (1989).

Germer, T. A., and Ho, W.,:

"The adsorption and photochemistry of Mo(CO)₆ on Rh(100),"
J. Chem. Phys., 89, 562 (1988).

Richter, L. J., Germer, T. A., Sethna, J. P., and Ho, W.,:

"Electron-energy-loss spectroscopy of H adsorbed on Rh(100): Interpretation of overtone spectra as two-phonon bound states,"
Phys. Rev. B, 38, 10403 (1988).

Richter, L. J., Germer, T. A., and Ho, W.,:

"Coadsorption-induced site changes: bridging hydrogen from CO and H on Rh(100),"
Surf. Sci., 195, L182 (1988).

Germer, T. A., Haegel, N. M., and Haller, E. E.,:

"Photo Hall-effect characterization of closely compensated Ge:Be,"
J. Appl. Phys., 60, 1055 (1986).