Return to the search form Results for: germer (author) + 1991-present : Optical Technology Germer, T.A., “Effect of line and trench profile variation on specular and diffuse reflectance from a periodic structure,” J. Opt. Soc. Am. A 24(3), 696-701 (March 2007). Germer, T.A., “Measuring interfacial roughness by polarized optical scattering,” in Light Scattering and Nanoscale Surface Roughness, Chapter 10, ed. by Alexei A. Maradudin, Springer, New York (2007), p. 259. Ramella-Roman, J.C., Boulbry, B., and Germer, T.A., Hemispherical imaging of skin with polarized light, in Saratov Fall Meeting 2006: Optical Technologies in Biophysics and Medicine VIII, ed. by Valery V. Tuchin, SPIE 6535, 65350U (2007). Germer, T.A., and Marx, E., Simulations of Optical Microscope Images, in Metrology, Inspection, and Process Control for Microlithography XX, ed. by C.N. Archie, SPIE 6152, 61520I1-11 (2006). Boulbry, B., Germer, T.A., and Ramella-Roman, J.C., A novel hemispherical spectro-polarimetric scattering instrument for skin lesion imaging, in Photonic Therapeutics and Diagnostics II, ed. by N. Kollias, et al., SPIE 6078, 128-134 (2006). Dyer, S.D., Dennis, T., Street, L.K., Etzel, S.M., Germer, T.A., and Dienstfrey, A., Spectroscopic phase-dispersion optical coherence tomography measurements of scattering phantoms, Opt. Express 14(18), 8138-8153 (2006). Dyer, S.D., Dennis, T., Williams, P.A., Street, L.K., Etzel, S.M., Espejo, J.R., Germer, T.A., and Milner, T.E., High Sensitivity Measurements of the Scattering Dispersion of Phantoms using Spectral Domain Optical Coherence Tomography, in Coherence Domain Optical Methods and Optical Coherence Tomography in Biomedicine X, ed. by V.V. Tuchin, J.A. Izatt, and J.G. Fujimoto, SPIE 6079, 307-311 (2006). Patrick, H.J., Attota, R., Germer, T.A., Stocker, M., and Silver, R.M., Scatterfield microscopy using conventional and back focal plane imaging with an engineered illumination field, in Metrology, Inspection, and Process Control for Microlithography XX, ed. by C.N. Archie, SPIE 6152, 61520J1-10 (2006). Germer, T.A. and Mulholland, G.W., Particle Size Metrology: Comparison Between Aerosol Electrical Mobility and Laser Surface Light Scattering Techniques, in Proc. Characterization and Metrology for ULSI Technology 2005, ed. by D.G. Seiler, A.C. Diebold, R. McDonald, C.R. Ayre, R.P. Khosla, S. Zollner, and E.M. Secula, (AIP, Melville, NY, 2005), vol. 788, p. 579-583. Attota, R., Bishop, M., Germer, T.A., Howard, L., Larrabee, R., Silver, R.M., and Stocker, M.T., Application of through-focus focus-metric analysis in high resolution optical metrology, in Metrology, Inspection, and Process Control for Microlithography XIX, ed. by R.M. Silver, Proc. SPIE 5752, 1441-1449 (2005). Attota, R., Bishop, M., Davidson, M., Germer, T.A., Howard, L., Larrabee, R., Marx, E., Silver, R.M.,and Stocker, M., High-resolution optical metrology, in Metrology, Inspection, and Process Control for Microlithography XIX, ed. by R.M. Silver, Proc. SPIE 5752, 67-79 (2005). Duncan, D., Germer, T.A., and Ramella-Roman, J.C., Out-of-plane polarimetric imaging of skin: Surface and subsurface effects, in Photonic Therapeutics and Diagnostics, Proc. SPIE 5686, ed. by K.E. Bartels, et. al (SPIE, Bellington, WA, 2005), p. 142-153. Germer, T.A. and Marx, E., Ray Model of Light Scattering By Flake Pigments Or Rough Surfaces Beneath Smooth Transparent Coatings, Appl. Opt. 43(6) 1266-1274 (2004). Kim, J.H., Ehrman, S.H., Mulholland, G.W., and Germer, T.A., Polarized Light Scattering by Dielectric And Metallic Spheres on Oxidized Silicon Surfaces, Appl. Opt. 43(3), 585-591 (2004). Kim, J.H., Ehrman, S.H., and Germer, T.A., Influence of Particle Oxide Coating on Light Scattering by Submicron Metal Particles on Silicon Wafers, Appl. Phys. Lett. 84(8) 1278-1280 (2004). Germer, T.A. and Fasolka, M.J., Characterizing Surface Roughness of Thin Films By Polarized Light Scattering, in Advanced Characterization Techniques for Optics, Semiconductors, and Nanotechnologies, ed. by A. Duparré and B. Singh, Proc. SPIE 5188, 264-275 (2003). Germer, T.A., Polarized Light Diffusely Scattered Under Smooth And Rough Surfaces, in Polarization Science and Remote Sensing, ed. by J.A. Shaw and J.S. Tyo, Proc. SPIE 5158, 193-204 (2003). Germer, T.A., Scattering by Slightly Non-spherical Particles on Surfaces, in Seventh Conference on Electromagnetic and Light Scattering by Nonspherical Particles: Theory, Measurements, and Applications, ed. by T. Wriedt (Universität Bremen, Bremen, 2003), pp. 93-96. Kim, J.H., Germer, T.A., Babushok, V.I., Mulholland, G.W., and Ehrman, S.H., C-Solvent Assisted Spray Pyrolysis for the Generation of Metal Particles, J. Mat. Res. 18(7), 1614-1622 (2003). Mulholland, G.W., Germer, T.A., and Stover, J.C., Modeling, Measurement, and Standards for Wafer Inspection, Government Microcircuits Applications and Critical Technologies, Countering Asymmetric Threats (GOMAC Tech) Conf., Tampa, Florida (2003), p. 273-276. Germer, T.A., Light scattering by slightly non-spherical particles on surfaces, Opt. Lett. 27, 1159-1161 (2002). Germer, T.A., Measurement of Lithographic Overlay by Light Scattering Ellipsometry, in Surface Scattering and Diffraction for Advanced Metrology II, ed. by Z.H. Gu, and A.A. Maradudin, Proc. SPIE 4780, 72-79 (2002). Germer, T.A., Mulholland, G.W., Kim, J.H., and Ehrman, S.H., Measurement of the 100 nm NIST SRM® 1963 by Laser Surface Light Scattering, in Advanced Characterization Techniques for Optical, Semiconductor, and Data Storage Components, ed. by A Duparré and B. Singh, Proc. SPIE 4779, 60-71 (2002). Kim, J.H., Germer, T.A., Mulholland, G.W., and Ehrman, S.H., Size-Monodisperse Metal Nanoparticles Via Hydrogen-Free Spray Pyrolysis, Advanced Materials 14(7), 518-521 (2002). Kim, J.H., Mulholland, G.W., Ehrman, S.H., and Germer, T.A., Polarized light scattering from dielectric and metallic spheres on silicon wafers, Appl. Opt. 41, 5405-5412 (2002). Nadal, M.E. and Germer, T.A., Colorimetric Characterization of Pearlescent Coatings, in Proc. Ninth Congress of the International Color Association, SPIE 4421, 757-760 (2002). Germer, T.A. and Nadal, M.E., Modeling the Appearance of Special Effect Pigment Coatings, in Surface Scattering and Diffraction for Advanced Metrology, ed. by Z.H. Gu and A.A. Maradudin, Proc. SPIE 4447, 77-86 (2001). Germer, T.A., Characterizing Interfacial Roughness by Light Scattering Ellipsometry, in Characterization and Metrology for ULSI Technology: 2000 International Conference, ed. by D.G. Seiler, A.C. Diebold, T.J. Shaffner, R. McDonald, W.M. Bullis, P.J. Smith, and E.M. Secula, Proc. AIP 550 (AIP, New York, 2001), p. 186-190. Germer, T.A., Comment on "Large Angle in-plane Light Scattering from Rough Surfaces," Appl. Opt. 40(31), 5708-5710 (2001). Germer, T.A., Polarized Light Scattering by Micro Roughness and Small Defects in Dielectric Layers, J. Opt. Soc. Am. A 18(6), 1279-1288 (2001). Germer, T.A., SCATMECH: Polarized Light Scattering C++ Class Library, Version 2.00, software and documentation [URL: http://physics.nist.gov/scatmech] (NIST, Gaithersburg, MD, 2001). Germer, T.A., Gupta, R., Hanssen, L.M., and Shirley, E.L., Optical Properties of Materials, Opt. Photon. News 12(2), 38-42 (2001). Kim, J.H., Ehrman, S.H., Mulholland, G.W., and Germer, T.A., Polarized Light Scattering from Metallic Particles on Silicon Wafers, in Optical Metrology Roadmap for the Semiconductor, Optical, and Data Storage Industries, ed. by A. Duparré and B. Singh, Proc. SPIE 4449 (2001), pp. 281-290. Germer, T.A. and Asmail, C.C., Goniometric Optical Scatter Instrument for Out-of-Plane Ellipsometry Measurements, Rev. Sci. Instrum. 70 (1999). Germer, T.A. and Asmail, C.C., Polarization of light scattered by microrough surfaces and subsurface defects, J. Opt. Soc. Am. A 16 (6), 1326–1332 (1999). Germer, T.A. and Sung, L., Polarized Light Scattering Measurements of Roughness, Subsurface Defects, Particles, and Dielectric Layers on Silicon Wafers, in 4th Conference on Electromagnetic and Light Scattering by Nonspherical Particles: Theory and Applications, ed. by F. Obelleiro, J.L. Rodríguez, and T. Wriedt (Vigo, Spain, 1999). pp. 223-230. Germer, T.A., Multidetector Hemispherical Polarized Light Scattering Instrument, in Rough Surface Scattering and Contamination, ed. by P.-T. Chen, Z.-H. Gu, and A.A. Maradudin, Proc. SPIE 3784, 304–313 (1999). Sung, L., Mulholland, G.W., and Germer, T.A., Polarization of Light Scattered by Particles on Silicon Wafers, in Surface Characterization for Computer Disks, Wafers, and Flat Panel Displays, ed. by J.C. Stover, Proc. SPIE 3619 (1999), 80-91. Sung, L., Mulholland, G.W., and Germer, T.A., Polarization of Light Scattered by Spheres on Dielectric Layers on Silicon, in Rough Surface Scattering and Contamination, ed by P.-T. Chen, Z.-H. Gu, and A.A. Maradudin, Proc. SPIE 3784, 296-303 (1999). Sung, L., Mulholland, G.W., and Germer, T.A., Polarized Light-Scattering Measurements of Dielectric Spheres upon a Silicon Surface, Opt. Lett. 24(13), 866–868 (1999). Germer, T.A. and Scheer, B.W., Polarization of out-of-plane optical scatter from SiO2 films grown on photolithographically-generated microrough silicon, in Scattering and Surface Roughness II, ed. by Z.-H. Gu and A.A. Maradudin, Proc. SPIE 3426, 106-168 (1998). Germer, T.A., Application of bidirectional ellipsometry to the characterization of roughness and defects in dielectric layers, in Flatness, Roughness, and Discrete Defect Characterization for Computer Disks, Wafers, and Flat Panel Displays II, ed. by J. C. Stover, Proc. SPIE 3275, 121-131 (1998). Germer, T.A., Seiler, D.G., Bullis, W.M., Diebold, A.C., McDonald, R., and Shaffner, T., Polarized Light Scattering and its Application to Microroughness, Particle, and Defect Detection, in Characterization and Metrology for ULSI Technology, ed. by AIP, (New York, NY, 1998), pp. 815-818. Kelley, E.F., Jones, G.R., and Germer, T.A., Display Reflectance Model Based on the BRDF, Displays 19, 27-34 (1998). Germer, T.A. and Asmail, C.C., A Goniometric Optical Scatter Instrument for Bidirectional Reflectance Distribution Function Measurements with Out-of-plane and Polarimetry Capabilities, in Scattering and Surface Roughness, ed. by Z.-H. Gu and A.A. Maradudin, Proc. SPIE 3141, 220-231 (1997). Germer, T.A. and Asmail, C.C., Bidirectional Ellipsometry and its Application to the Characterization of Surfaces, in Polarization: Measurement, Analysis, and Remote Sensing, ed. by D.H. Goldstein and R.A. Chipman, Proc. SPIE 3121, 173-182 (1997). Germer, T.A., Angular Dependence and Polarization of Out-of-plane Optical Scattering from Particulate Contamination, Subsurface Defects, and Surface Microroughness, Appl. Opt. 36, 8798-8805 (1997). Germer, T.A., Asmail, C.C., and Scheer, B.W., Polarization of Out-of-plane Scattering from Microrough Silicon, Opt. Lett. 22, 1284 (1997). Germer, T.A., Kolasinski, K.W., Stephenson, J.C., and Richter, L.J., Depletion-electric-field-induced Second-harmonic Generation Near Oxidized GaAs (001) Surfaces, Phys. Rev. B 55, 10694-10706 (1997). Park, B.C., Vorburger, T.V., Germer, T.A., and Marx, E., Scattering from Sinusoidal Gratings, in Scattering and Surface Roughness, ed. by Z.-H. Gu and A.A. Maradudin, Proc. SPIE 3141, 65-77 (1997). Jones, G.R., Kelley, E.F., and Germer, T.A., Specular and Diffuse Reflection Measurements of Electronic Displays, in Society of Information Displays 96 Digest, 203-206 (1996). Germer, T.A., Stephenson, J.C., Heilweil, E.J., and Cavanagh, R.R., Picosecond Time-Resolved Adsorbate Response to Substrate Heating: Spectroscopy and Dynamics of CO/Cu(100), J. Chem. Phys. 101, 1704 (1994). Germer, T.A., Stephenson, J.C., Heilweil, E.J. and Cavanagh, R.R., Picosecond Measurement of Substrate-to-adsorbate Energy Transfer: The Frustrated Translation of CO/Pt(111), J. Chem. Phys. 98, 9986 (1993). Germer, T.A., Stephenson, J.C., Heilweil, E.J., and Cavanagh, RR., Hot Carrier Excitation of Adlayers: Time-resolved Measurement of Adsorbate-Lattice Coupling, Phys. Rev. Lett. 71, 3327 (1993). Cavanagh, R.R., Germer, T.A., Heilweil, E.J. and Stephenson, J.C., Time-resolved Measurements of Substrate to Adsorbate Energy Transfer, Faraday Discuss. 96, 235 (1993). Germer, T., Microroughness-blind Optical Scattering Instrument, Patent Serial Number: 90/058,182, Patent Number: 6,034,776 (2000). Germer, T.A., Measurement of Roughness of Two Interfaces of a Dielectric Film by Scattering Ellipsometry, Phys. Rev. Lett. 85(2), 349-352 (2000). Germer, T.A., SCATMECH: Polarized Light Scattering C++ Class Library, software and document [online: physics.nist.gov/scatmech] (NIST, Gaithersburg, 2000). Germer, T.A., Rinder, T., and Rothe, H., Polarized light scattering measurements of polished and etched steel surfaces, in Scattering and Surface Roughness III, ed. by Z.-H. Gu, and A.A. Maradudin, Proc., SPIE 4100, 148-155 (2000). Marx, E., Germer, T.A., Vorburger, T.V. and Park, B.C., Angular Distribution of Light Scattered from a Sinusoidal Grating, Appl. Opt. 39(25), 4473-4485 (2000). Priest, R.G. and Germer, T.A., Polarimetric BRDF in the Microfacet Model: Theory and Measurements, in Proc., 2000 Meeting of the Military Sensing Symposia Specialty Group on Passive Sensors 1, 169-181, Ann Arbor, MI (2000). Shaw, P.S., Gupta, R., Germer, T.A., Arp, U., Lucatorto, T., and Lykke, K.R., Characterization of Materials using UV Radiometric Beamline at SURF III, Metrologia 37, 551 (2000). You got 62 matches Return to the search form