Return to the search form Results for: tsai (author) + 1991-present : Optical Technology Tsai, B.K., A Summary of Lightpipe Radiation Thermometry Research at NIST, 111(1), 9-30 (2006). Noorma, M., Mekhontsev, S., Khromchenko, K., Gura, A., Litorja, M., Tsai, B., and Hanssen, L., Design and characterization of Si and InGaAs pyrometers for radiance temperature scale realization between 232 ºC and 962 ºC, SPIE 6205, 620501-1 - 620501-7 (2006). Tsai, B.K., DeWitt, D.P., Early, E.A., Hanssen, L.M., Mekhontsev, S.N., Rink, M., Kreider, K.G., Lee, B.J., and Zhang, Z., Emittance standards for improved radiation thermometry during thermal processing of silicon materials, in Proc. TEMPMEKO 2004, ed. by D. Zvizdic (LPM/FSB, Zagreb, Croatia, 2005), p. 1179-1184. DeWitt, D.P., Early, E.A., Lee, B.J., Tsai, B.K., and Zhang, Z.M., Modeling Radiative Properties of Silicon with Coatings and Comparison with Reflectance Measurements, J. Thermophys Heat Trans. 19(4), 558-565 (2005). Tsai, B.K., Bodycomb, J., DeWitt, D.P., Kreider, K.G., and Kimes, W.A., Emissivity Compensated Pyrometry for Specular Silicon Surfaces on the NIST RTP Test Bed, in Proc. 12th IEEE Int'l Conf., Advanced Thermal Processing - RTP 2004, September 2004, Portland, OR (2004), 167-172. Tsai, B.K., Gibson, C.E., Annageri, M.V., DeWitt, D.P., and Saunders, R.D., Heat-Flux Sensor Calibration, NIST Spec. Publ. 250-65 (2004). Bodycomb, J., DeWitt, D.P., Kimes, W.A., Kreider, K.G., and Tsai, B.K., Emissivity Compensated Pyrometry for Specular Silicon Surfaces on the NIST RTP Test Bed, in Proc. the 12th IEE Intl. Conf. on Advanced Thermal Processing RTP 2004, Portland, OR, 167-172 (2004). Kimes, W.A., Kreider, K.G., Ripple, D.C., and Tsai, B.K., In Situ Calibration of Lightpipe Radiometers for Rapid Thermal Processing between 300 °C to 700 °C, in Proc. 12th IEEE International Conference on Advanced Thermal Processing, Portland, OR (2004), 156-161. Kreider, K.G., DeWitt, D.P., Fowler, J.B., Proctor, J.E., Kimes, W.A., Ripple, D.C., and Tsai, B.K., Comparing the Transient Response of a Resistive-Type Sensor with a Thin-Film Thermocouple During the Post-Exposure Bake Process, Data Analysis and Modeling for Process Control, Proc. SPIE, 5378, 81-92 (2004). Tsai, B.K., Traceable Temperature Calibrations of Radiation Thermometers for Rapid Thermal Processing, in Proc. 11th IEEE Int'l Conf. Advanced Thermal Processing - RTP 2003 (2003), 101-106. Kreider, K.G., Chen, D.H., DeWitt, D.P., Kimes, W.A., and Tsai, B.K., Lightpipe Proximity Effects on Si Wafer Temperature in Rapid Thermal Processing Tools, in Proc. 11th IEEE Int'l Conf. Advanced Thermal Processing - RTP 2003 (2003), 125-129. Kreider, K.G., Chen, D.H., Kimes, W.A., DeWitt, D.P., and Tsai, B.K., Effects of Lightpipe Proximity on Si Wafer Temperature in Rapid Thermal Processing Tools, in Proc. 2003 Int'l Conf. Characterization and Metrology for ULSI Technology (2003), 200-204. Murthy, A.V.; Tsai, B.K.; and Saunders, R.D. Calibration of a Heat Flux Sensor up to 200 kW/m2 in a Spherical Blackbody, Symp. in Thermal Measurements: The Foundation of Fire Standards, ed. by L.A. Gritzo and N. Alvares, 1427 (ASTM STP, Pennsylvania, 2003), p. 51-66. Tsai, B.K. and DeWitt, D.P., Improving Temperature Accuracy for Rapid Thermal Processing at NIST, in Proc. NCSL International Conference, August 4-8, 2002, San Diego, CA, 3E-1 (2002), 1-19. Chen, D.H., DeWitt, D.P., Kreider, K.G., Tsai, B.K., Kimes, W.A., Effects of Wafer Emissivity on Rapid Thermal Processing Temperature Measurement, RTP 2002 Proc. 10th IEEE International Conference on Advanced Thermal Processing, Vancouver, Canada (2002), 59-67. Tsai, B.K., Widmann, J.F., Bundy, M., and Hill, S.M., Characterization of an Infrared Spectrograph for Non-Contact Thermometry Applications Using a Sodium Heat Pipe Blackbody, in Proc. Thermosense XXIII, ed. by A.E. Rozlosnik and R.B. Dinwiddie 4360 (2001), p. 438-446. Gibson, C.E., Yoon, H.W., Tsai, B.K., Johnson, B.C., and Saunders, R.D. Non-Contact Thermometry in the Optical Technology Division at NIST, in Thermosense XXIII, ed. by A.E. Rozlosnik and R.B. Dinwiddie, Proc. SPIE 4360 (Bellingham, Washington: Soc. Photo-Optical Instrumentation Engineers, 2001), p. 333-341. Kreider, K.G., Allen, D.W., Chen, D.H., DeWitt, D.P., Meyer, C.W., and Tsai, B.K., Effects of Wafer Emissivity on Lightpipe Radiometry in RTP Tools, 9th Intl. Conf. Advanced Thermal Processing of Semiconductors (2001), p. 163-168. Murthy, A.V., Tsai, B.K., and Saunders, R.D., Transfer Calibration Validation Tests on a Heat Flux Sensor in the 51 mm High Temperature Blackbody, 47th Intl. Instrum. Symp., Proc. ISA 409 (2001). Murthy, A.V., Tsai, B.K., and Saunders, R.D., Transfer Calibration Validation Tests on a Heat Flux Sensor in the 51 mm High-Temperature Blackbody, NIST J. Res. 106(5), 823 (2001). Zhou, Y.H., Zhang, Z.M., DeWitt, D.P., and Tsai, B.K., Effects of Radiative Properties of Surfaces on Radiometric Temperature Measurement, 9th Intl. Conf. Advanced Thermal Processing of Semiconductors (2001), p. 179-188. Tsai, B.K. and DeWitt, D.P., ITS-90 Calibration of Radiometers Using Wire/Thin-Film Thermocouples in the NIST RTP Tool: Effective Emissivity Modeling, in 7th Intl Conf. Advanced Thermal Processing of Semiconductors (Colorado Springs, CO, 1999), p. 125-135. Tsai, B.K., DeWitt, D.P., Lovas, F.J., Kreider, K.G., Meyer, C.W., and Allen, D.W., Chamber Radiation Effects on Calibration of Radiation Thermometers with a Thin-Film Thermocouple Test Wafer, in Proc. 7th Intl. Symp. on Temp. and Thermal Meas. in Industry and Science (TEMPMEKO '99), ed. by J.F. Dubbeldam and M.J. de Groot (Delft, The Netherlands, 1999), p. 726-731. Meyers, C.W., Allen, D.W., DeWitt, D.P., Kreider, K.G., Lovas, F.J., and Tsai, B.K., ITS-90 Calibration of Radiometers Using Wire/Thin-Film Thermocouples in the NIST RTP Tool: Experimental Procedures and Results, 7th International Conference on Advanced Thermal Processing of Semiconductors, Colorado Springs, CO Thermal (1999), 136-141. Murthy, A.V., Tsai, B.K., and Saunders, R.D., Comparative Calibration of Heat Flux Sensors in Two Blackbody Facilities, J. Res. Natl. Inst. Stand. Technol. 104(5), 487-494 (1999). Murthy, A.V., Tsai, B.K., and Saunders, R.D., High Heat Flux Sensors Calibration in a Cooled Enclosure, Proc. 45th International Instrumentation Symposium, Albuquerque, NM, 91-100 (1999). Tsai, B.K. and Johnson, B.C., Radiometric Traceability for Fundamental Measurements: Estimation and Evaluation of Combined Standard Uncertainties, Metrologia 35, 587-593 (1998). Tsai, B.K., Developments in the New Spectral Irradiance Scale at NIST, J. Res. Natl. Inst. Stand. Tech. 102(5), 551-558 (1998). Gibson, C.E., Tsai, B.K., and Parr, A.C., Radiance Temperature Calibrations, NIST Special Publication 250-43, (U.S. Government Printing Office, Washington, D.C., 1998). Kreider, K.G., DeWitt, D.P., Tsai, B.K., Lovas, F.J., and Allen, D.W., Calibration Wafer for Temperature Measurement in RTP Tools, in Intl. Conference: Characterization and Metrology for ULSI Technology, Gaithersburg, MD (1998), p. 303-309. Kreider, K.G., DeWitt, D.P., Tsai, B.K., Lovas, F.J., and Allen, D.W., RTP Calibration Wafer Using Thin-Film Thermocouples, in Rapid Thermal and Integrated Processing VII, ed. by M.C. Ozturk, F. Roozeboom, P.J. Timans, and S.H. Pas, Mat. Res. Soc. Symp. Proc. 525 (1998), p. 87. Lovas, F.J., Tsai, B.K., and Gibson, C.E., Meeting RTP Temperature Accuracy Requirements: Measurement and Calibrations at NIST, in Rapid Thermal and Integrated Processing. VII, ed. by M.C. Ozturk, F. Roozeboom, P.J. Timans, and S.H. Pas, Mat. Res. Soc. Symp. Proc. 525 (1998), p. 127. Murthy, A.V., Tsai, B.K., and Saunders, R.D., High Heat Flux Sensor Calibration using Blackbody Radiation, Metrologia 35, 501-504 (1998). Tsai, B.K., Lovas, F.J., DeWitt, D.P., Kreider, K.G., Burns, G.W., and Allen, D.W., In-Chamber Thermometry Calibration using a Silicon Proof-Wafer, in Proc. 5th International Conference of Advanced Thermal Processing of Semiconductors: RTP'97, 340-346 (1997). Murthy, A.V. and Tsai, B.K., Radiative Calibration of Heat flux Sensors at NIST - an Overview, in IMECE '97, Vol. 3, HTD 353 (1997), pp. 159-164. Murthy, A.V. and Tsai, B.K., Transfer Calibration of Heat Flux Sensors at NIST, in SME Proc. 32nd National Heat Transfer Conference, HTD-345, 81-88 (1997). Murthy, A.V., Tsai, B.K, and Gibson, C.E., Calibration of High Heat Flux Sensors at NIST, J. Res. Natl. Inst. Stand. Technol. 102, 479 (1997). Tsai, B.K., Developments in the New Spectral Irradiance Scale at the National Institute of Standards and Technology, Preparing Metrology for the Next Millennium, 1, 325-341 (1996). Tsai, B.K., Johnson, B.C., Saunders, R.D., and Cromer, C.L., Comparison of Filter Radiometer Spectral Responsivity with the NIST Spectral Irradiance and Illuminance Scales, Metrologia 32(6), 473-477 (1995). Tsai, B.K., Johnson, B.C., and Saunders, R.D., Evaluation of the Radiation Characteristics of a High-Temperature Blackbody, Infrared Spaceborne Remote Sensing III, 2553, 514-523 (1995). Tsai, B.K., DeWitt, D.P., and Shaffer, G.H., Macroscopic Spread Function Analysis for subsurface Scattering of Semitransparent Materials, J. Thermophys. Heat Trans. 8(2), 202-207 (1994). Tsai, B.K., DeWitt, D.P., and Shaffer, G.H., Utility of the Spread Function in Reflectometric Applications and Design, Opt. Eng. 33(1), 102-108 (1994). Mach, C.A., DeWitt, D.P., Tsai, B.K., and Yetter, G., Modeling of Solvent Evaporation Effects for Hot Plate Baking of Photoresist, SPIE 2195, 584-595 (1994). Tsai, B.K., Meyer, C.W., and Lovas, F.J., Characterization of Lightpipe Radiation Thermometers for The NIST Test Bed, in 8th Intl. Conf. on Advanced Thermal Processing of Semiconductors, Gaithersburg, MD (2000), p. 83-93. Murthy, A.V., Tsai, B.K., and Saunders, R.D., Radiative Calibration of Heat Flux Sensors at NIST- Facilities and Techniques, J. Res. Natl. Inst. Stand. Technol. 105(2), 293-305 (2000). Shen, Y.J., Zhang, Z.M., Tsai, B.K., and DeWitt, D.P., Bidirectional Reflectance Distribution Function of Rough Silicon Wafers, in Proc., 14th Symp. on Thermophysical Properties (2000), p. 305-321. Zhou, Y.H., Shen, Y.J., Zhang, Z.M., Tsai, B.K., and DeWitt, D.P., Impact of Directional Properties on the Radiometric Temperature Measurement in Rapid Thermal Processing, in 8th Intl. Conf. on Advanced Thermal Processing of Semiconductors, Gaithersburg, MD (2000), p. 94-103. You got 47 matches Return to the search form